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1 Ergebnisse
1
Quadrant Yield Loss Due to Resist Chemistry and Device Layo..:
, In:
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Chow, Jane
;
Dineshan, Adukkadukkam
;
Siong, Eng Choon
.. - p. 1-3 , 2023
Link:
https://doi.org/10.1109/ASMC57536.2023.10121083
RT T1
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
: T1
Quadrant Yield Loss Due to Resist Chemistry and Device Layout Interaction
UL https://suche.suub.uni-bremen.de/peid=ieee-10121083&Exemplar=1&LAN=DE A1 Chow, Jane A1 Dineshan, Adukkadukkam A1 Siong, Eng Choon A1 Goh, Alan A1 Juncheng, Zhou YR 2023 SN 2376-6697 K1 Performance evaluation K1 Chemistry K1 Layout K1 Lithography K1 Resists K1 Inspection K1 Surfaces K1 Resist chemistry K1 resist residue K1 topology K1 resist coating SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/ASMC57536.2023.10121083 DO https://doi.org/10.1109/ASMC57536.2023.10121083 SF ELIB - SuUB Bremen
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