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1 Ergebnisse
1
Reducing CFx residue from Etching Process by Optimizing Pos..:
, In:
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Yang, Ki Dong
;
Yang, Heeseong
;
Han, Eunyoung
... - p. 1-5 , 2023
Link:
https://doi.org/10.1109/ASMC57536.2023.10121107
RT T1 <cTitle>2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>Reducing CFx residue from Etching Process by Optimizing Post Plamsa Treatment</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10121107&Exemplar=1&LAN=DE A1 Yang, Ki Dong A1 Yang, Heeseong A1 Han, Eunyoung A1 Kim, Youngeun A1 Han, Taehee A1 Kim, Young Jeong A1 Lim, Nuri A1 Lim, Jungyup A1 Kim, Joong Jung YR 2023 SN 2376-6697 K1 Systematics K1 Humidity K1 Semiconductor device manufacture K1 Ions K1 Cleaning K1 Plasmas K1 Manufacturing K1 dry etching process K1 reaction byproducts K1 in-situ cleaning K1 CF residue SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.1109/ASMC57536.2023.10121107 DO https://doi.org/10.1109/ASMC57536.2023.10121107 SF ELIB - SuUB Bremen
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