I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Double U-Net based Virtual Metrology on Plasma-Etch CD-SEM ..:
, In:
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Ding, Shuhan
;
Peng, Yiling
;
Davaji, Benyamin
... - p. 1-5 , 2023
Link:
https://doi.org/10.1109/ASMC57536.2023.10121128
RT T1 <cTitle>2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>Double U-Net based Virtual Metrology on Plasma-Etch CD-SEM Images : AM: Advanced Metrology</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10121128&Exemplar=1&LAN=DE A1 Ding, Shuhan A1 Peng, Yiling A1 Davaji, Benyamin A1 Doerschuk, Peter C. A1 Lal, Amit A1 Clark, Jeremy A1 Bordonaro, Garry A1 Genova, Vincent A1 Ober, Christopher K. A1 Ayres, Steve A1 Heuser, Marco YR 2023 SN 2376-6697 K1 Training K1 Semiconductor device measurement K1 Image segmentation K1 Visualization K1 Metrology K1 Semiconductor device manufacture K1 Plasma measurements K1 Virtual Metrology K1 Deep Learning K1 U-Net K1 CD-SEM image processing K1 Nanofabrication SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.1109/ASMC57536.2023.10121128 DO https://doi.org/10.1109/ASMC57536.2023.10121128 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)
