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1 Ergebnisse
1
A Novel Continuous Plasma Etch with Optimized Algorithms fo..:
, In:
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Ye, Jeff J.
;
Lu, Fei
;
Sheng, Haifeng
. - p. 1-5 , 2023
Link:
https://doi.org/10.1109/ASMC57536.2023.10121134
RT T1 <cTitle>2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>A Novel Continuous Plasma Etch with Optimized Algorithms for Yield Improvement and High Production Throughput in NOR Memory</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10121134&Exemplar=1&LAN=DE A1 Ye, Jeff J. A1 Lu, Fei A1 Sheng, Haifeng A1 Singh, Param YR 2023 SN 2376-6697 K1 Low-pass filters K1 Production K1 Resists K1 Semiconductor device manufacture K1 Throughput K1 Motion pictures K1 Product design K1 continuous plasma process K1 missing contacts K1 raw process time K1 yield improvement SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.1109/ASMC57536.2023.10121134 DO https://doi.org/10.1109/ASMC57536.2023.10121134 SF ELIB - SuUB Bremen
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