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1 Ergebnisse
1
Study on Ashing-less Dry Etching Process to Eliminate Q-tim..:
, In:
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Myeong, Jinbum
;
Kang, Joon Young
;
Sook Kim, Hyun
... - p. 1-4 , 2023
Link:
https://doi.org/10.1109/ASMC57536.2023.10121148
RT T1
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
: T1
Study on Ashing-less Dry Etching Process to Eliminate Q-time Defect Formation
UL https://suche.suub.uni-bremen.de/peid=ieee-10121148&Exemplar=1&LAN=DE A1 Myeong, Jinbum A1 Kang, Joon Young A1 Sook Kim, Hyun A1 Kim, Jinwoong A1 Kim, Yeji A1 Kim, Kang Uk A1 Sohn, Seokyong A1 Choi, Ohduk A1 Kang, Bokoo A1 Heo, Min A1 Yim, Jongsoo YR 2023 SN 2376-6697 K1 Silicon compounds K1 Productivity K1 Manufacturing processes K1 Dry etching K1 Films K1 Semiconductor devices K1 Humidity SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/ASMC57536.2023.10121148 DO https://doi.org/10.1109/ASMC57536.2023.10121148 SF ELIB - SuUB Bremen
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