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1 Ergebnisse
1
Control Gate Device Leakage Reduction by Improving Polysili..:
, In:
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Ye, Jeff J.
;
Wu, Meng-Yin
;
Liu, Hank
- p. 1-5 , 2023
Link:
https://doi.org/10.1109/ASMC57536.2023.10121149
RT T1
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
: T1
Control Gate Device Leakage Reduction by Improving Polysilicon Etch Uniformity and Active Area Recess
UL https://suche.suub.uni-bremen.de/peid=ieee-10121149&Exemplar=1&LAN=DE A1 Ye, Jeff J. A1 Wu, Meng-Yin A1 Liu, Hank YR 2023 SN 2376-6697 K1 Semiconductor device modeling K1 Process control K1 Fluid flow K1 Logic gates K1 Semiconductor device manufacture K1 Predictive models K1 Temperature control K1 device leakage K1 gate K1 NOR K1 over-etch K1 polysilicon etch K1 uniformity SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.1109/ASMC57536.2023.10121149 DO https://doi.org/10.1109/ASMC57536.2023.10121149 SF ELIB - SuUB Bremen
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