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Overview of scalable transfer approaches to enable epitaxia..:

, In: 2023 International VLSI Symposium on Technology, Systems and Applications (VLSI-TSA/VLSI-DAT),

Brems, Steven ; Ghosh, Souvik ; Smets, Quentin... - p. 1-2 , 2023

Link: https://doi.org/10.1109/VLSI-TSA/VLSI-DAT57221.2023.10..

RT 
T1 <cTitle>2023 International VLSI Symposium on Technology, Systems and Applications (VLSI-TSA/VLSI-DAT)</cTitle>: T1 <Title>Overview of scalable transfer approaches to enable epitaxial 2D material integration</Title>

UL https://suche.suub.uni-bremen.de/peid=ieee-10134381&Exemplar=1&LAN=DE
				
A1 Brems, Steven
A1 Ghosh, Souvik
A1 Smets, Quentin
A1 Boulon, Marie-Emmanuelle
A1 Boelen, Andries
A1 Kennes, Koen
A1 Tsai, Hung-Chieh
A1 Chancerel, Francois
A1 Merckling, Clement
A1 Wyndaele, Pieter-Jan
A1 De Marneffe, Jean-Francois
A1 Schram, Tom
A1 Kumar, Pawan
A1 Sergeant, Stefanie
A1 Nuytten, Thomas
A1 De Gendt, Stefan
A1 Silva, Henry Medina
A1 Groven, Benjamin
A1 Morin, Pierre
A1 Kar, Gouri Sankar
A1 De la Rosa, Cesar Lockhart
A1 Yudistira, Didit
A1 Van Campenhout, Joris
A1 Asselberghs, Inge
A1 Phommahaxay, Alain
YR 2023
K1 Fabrication
K1 Atomic layer deposition
K1 Two dimensional displays
K1 Semiconductor device reliability
K1 Materials reliability
K1 Very large scale integration
K1 Oxidation
SP 1
OP 2
LK http://dx.doi.org/https://doi.org/10.1109/VLSI-TSA/VLSI-DAT57221.2023.10134381
DO https://doi.org/10.1109/VLSI-TSA/VLSI-DAT57221.2023.10134381
SF ELIB - SuUB Bremen

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