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Overview of scalable transfer approaches to enable epitaxia..:
, In:
2023 International VLSI Symposium on Technology, Systems and Applications (VLSI-TSA/VLSI-DAT)
,
Brems, Steven
;
Ghosh, Souvik
;
Smets, Quentin
... - p. 1-2 , 2023
Link:
https://doi.org/10.1109/VLSI-TSA/VLSI-DAT57221.2023.10..
RT T1
2023 International VLSI Symposium on Technology, Systems and Applications (VLSI-TSA/VLSI-DAT)
: T1
Overview of scalable transfer approaches to enable epitaxial 2D material integration
UL https://suche.suub.uni-bremen.de/peid=ieee-10134381&Exemplar=1&LAN=DE A1 Brems, Steven A1 Ghosh, Souvik A1 Smets, Quentin A1 Boulon, Marie-Emmanuelle A1 Boelen, Andries A1 Kennes, Koen A1 Tsai, Hung-Chieh A1 Chancerel, Francois A1 Merckling, Clement A1 Wyndaele, Pieter-Jan A1 De Marneffe, Jean-Francois A1 Schram, Tom A1 Kumar, Pawan A1 Sergeant, Stefanie A1 Nuytten, Thomas A1 De Gendt, Stefan A1 Silva, Henry Medina A1 Groven, Benjamin A1 Morin, Pierre A1 Kar, Gouri Sankar A1 De la Rosa, Cesar Lockhart A1 Yudistira, Didit A1 Van Campenhout, Joris A1 Asselberghs, Inge A1 Phommahaxay, Alain YR 2023 K1 Fabrication K1 Atomic layer deposition K1 Two dimensional displays K1 Semiconductor device reliability K1 Materials reliability K1 Very large scale integration K1 Oxidation SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/VLSI-TSA/VLSI-DAT57221.2023.10134381 DO https://doi.org/10.1109/VLSI-TSA/VLSI-DAT57221.2023.10134381 SF ELIB - SuUB Bremen
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