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1 Ergebnisse
1
Optimization of Retention in Ferroelectricity Boosted Gate ..:
, In:
2023 IEEE International Memory Workshop (IMW)
,
Breuil, L.
;
Popovici, M.
;
Stiers, J.
... - p. 1-4 , 2023
Link:
https://doi.org/10.1109/IMW56887.2023.10145986
RT T1
2023 IEEE International Memory Workshop (IMW)
: T1
Optimization of Retention in Ferroelectricity Boosted Gate Stacks for 3D NAND
UL https://suche.suub.uni-bremen.de/peid=ieee-10145986&Exemplar=1&LAN=DE A1 Breuil, L. A1 Popovici, M. A1 Stiers, J. A1 Arreghini, A. A1 Ramesh, S. A1 Bosch, G. Van Den A1 Houdt, J. Van A1 Rosmeulen, M. YR 2023 SN 2573-7503 K1 Silicon compounds K1 Three-dimensional displays K1 Ferroelectric materials K1 Logic gates K1 Programming K1 Boosting K1 Capacitance SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/IMW56887.2023.10145986 DO https://doi.org/10.1109/IMW56887.2023.10145986 SF ELIB - SuUB Bremen
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