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1 Ergebnisse
1
Selective ALD Mo Deposition in 10nm Contacts:
, In:
2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)
,
van der Veen, Marleen H.
;
Maes, J. W.
;
Pedreira, O. Varela
... - p. 1-3 , 2023
Link:
https://doi.org/10.1109/IITC/MAM57687.2023.10154783
RT T1 <cTitle>2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)</cTitle>: T1 <Title>Selective ALD Mo Deposition in 10nm Contacts</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10154783&Exemplar=1&LAN=DE A1 van der Veen, Marleen H. A1 Maes, J. W. A1 Pedreira, O. Varela A1 Zhu, C. A1 Tierno, D. A1 Datta, S. A1 Jourdan, N. A1 Decoster, S. A1 Wu, C. A1 Mousa, M. A1 Byun, Y. A1 Struyf, H. A1 Park, S. A1 Tokei, Z. YR 2023 SN 2380-6338 K1 Resistance K1 Electromigration K1 Metallization K1 Atomic layer deposition K1 Routing K1 Dielectrics K1 Reliability K1 Molybdenum K1 selective K1 ALD K1 contacts K1 via SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/IITC/MAM57687.2023.10154783 DO https://doi.org/10.1109/IITC/MAM57687.2023.10154783 SF ELIB - SuUB Bremen
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