I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Semimetallic Atomic Layer Deposited TiS2 Thin Films for Con..:
, In:
2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)
,
Yoon, Hwi
;
Seo, Jeongwoo
;
Lee, Sangyoon
... - p. 1-3 , 2023
Link:
https://doi.org/10.1109/IITC/MAM57687.2023.10154841
RT T1 <cTitle>2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)</cTitle>: T1 <Title>Semimetallic Atomic Layer Deposited TiS2 Thin Films for Contact Resistance Improvement of MoS2-based Thin Film Transistor</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10154841&Exemplar=1&LAN=DE A1 Yoon, Hwi A1 Seo, Jeongwoo A1 Lee, Sangyoon A1 Yoo, Jisang A1 Nam, Yunyong A1 Lim, Jun Hyung A1 Chung, Seung-Min A1 Kim, Hyungjun YR 2023 SN 2380-6338 K1 Temperature K1 Metallization K1 Atomic layer deposition K1 Titanium K1 Conductivity K1 Contact resistance K1 Thin film transistors K1 Titanium disulfide K1 atomic layer deposition K1 semimetal K1 contact resistance K1 2D material K1 thin film transistor SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/IITC/MAM57687.2023.10154841 DO https://doi.org/10.1109/IITC/MAM57687.2023.10154841 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)
