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1 Ergebnisse
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In situ Post Etch Treatment on Ge-rich GST after etching in..:
, In:
2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)
,
Boixaderas, C.
;
Canvel, Y.
;
Fontaine, B.
... - p. 1-3 , 2023
Link:
https://doi.org/10.1109/IITC/MAM57687.2023.10154885
RT T1 <cTitle>2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)</cTitle>: T1 <Title>In situ Post Etch Treatment on Ge-rich GST after etching in HBr-based plasma</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10154885&Exemplar=1&LAN=DE A1 Boixaderas, C. A1 Canvel, Y. A1 Fontaine, B. A1 Lagrasta, S. A1 Dubois, J. A1 Gouraud, P. A1 Posseme, N. A1 Martinez, E. YR 2023 SN 2380-6338 K1 Phase change materials K1 Performance evaluation K1 Metallization K1 Phase change random access memory K1 Etching K1 Plasmas K1 Reliability K1 PCRAM K1 plasma etching K1 GST K1 defectivity K1 In Situ Post Etch Treatment SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/IITC/MAM57687.2023.10154885 DO https://doi.org/10.1109/IITC/MAM57687.2023.10154885 SF ELIB - SuUB Bremen
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