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1 Ergebnisse
1
Nanosheet-based Device Architectures with Front/Backside Co..:
, In:
2023 21st International Workshop on Junction Technology (IWJT)
,
Veloso, A.
;
Eneman, G.
;
Matagne, P.
... - p. 1-5 , 2023
Link:
https://doi.org/10.23919/IWJT59028.2023.10175170
RT T1
2023 21st International Workshop on Junction Technology (IWJT)
: T1
Nanosheet-based Device Architectures with Front/Backside Connectivity: Opportunities for S/D Engineering to Enable Advanced CMOS Logic Scaling
UL https://suche.suub.uni-bremen.de/peid=ieee-10175170&Exemplar=1&LAN=DE A1 Veloso, A. A1 Eneman, G. A1 Matagne, P. A1 Keersgieter, A. De A1 Hikavyy, A. A1 Favia, P. A1 Horiguchi, N. YR 2023 SN 2768-2153 K1 Wiring K1 Three-dimensional displays K1 Scalability K1 Logic gates K1 FinFETs K1 Routing K1 Nanoscale devices SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.23919/IWJT59028.2023.10175170 DO https://doi.org/10.23919/IWJT59028.2023.10175170 SF ELIB - SuUB Bremen
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