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1 Ergebnisse
1
High Performance Ge FinFET CMOS Invertor with $\mathrm{I}_{..:
, In:
2023 Silicon Nanoelectronics Workshop (SNW)
,
Wu, Cheng-Yu
;
Ruan, Dun-Bao
;
Chang-Liao, Kuei-Shu
... - p. 23-24 , 2023
Link:
https://doi.org/10.23919/SNW57900.2023.10183924
RT T1
2023 Silicon Nanoelectronics Workshop (SNW)
: T1
High Performance Ge FinFET CMOS Invertor with $\mathrm{I}_{\text{ON}}=2.0\ \text{mA}/\mu\mathrm{m}$ at $\mathrm{V}_{\text{OV}}=1\mathrm{V}, \mathrm{S}.\mathrm{S}.=64\ \text{mV}/\text{dec},\mathrm{I}_{\text{ON}}/\mathrm{I}_{\text{OFF}}=2.5\times 10^{6}$, and $\text{Voltage}\ \text{Gain}=90\ \mathrm{V}/\mathrm{V}$ by Using High Pressure Supercritical Fluid Hydroxide Oxidation
UL https://suche.suub.uni-bremen.de/peid=ieee-10183924&Exemplar=1&LAN=DE A1 Wu, Cheng-Yu A1 Ruan, Dun-Bao A1 Chang-Liao, Kuei-Shu A1 Lee, Yao-Jen A1 Chiu, Yu-Chuan A1 Liu, Chih-Wei A1 Liu, Guan-Ting A1 Kuo, Bo-Lien A1 Yang, Kai-Chun A1 Li, Cheng-Han A1 Liu, Po-Tsun YR 2023 SN 2161-4644 K1 Fluids K1 Conferences K1 Voltage K1 Germanium K1 FinFETs K1 CMOS technology K1 Oxidation SP 23 OP 24 LK http://dx.doi.org/https://doi.org/10.23919/SNW57900.2023.10183924 DO https://doi.org/10.23919/SNW57900.2023.10183924 SF ELIB - SuUB Bremen
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