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1 Ergebnisse
1
Enhanced Performance for SiGe/Si Gate-All-Around Field-Effe..:
, In:
2023 Silicon Nanoelectronics Workshop (SNW)
,
Chen, Wei-Ren
;
Ruan, Dun-Bao
;
Chang-Liao, Kuei-Shu
... - p. 25-26 , 2023
Link:
https://doi.org/10.23919/SNW57900.2023.10183954
RT T1
2023 Silicon Nanoelectronics Workshop (SNW)
: T1
Enhanced Performance for SiGe/Si Gate-All-Around Field-Effect-Transistor with Ge Condensation Using Supercritical Fluid Treatment
UL https://suche.suub.uni-bremen.de/peid=ieee-10183954&Exemplar=1&LAN=DE A1 Chen, Wei-Ren A1 Ruan, Dun-Bao A1 Chang-Liao, Kuei-Shu A1 Wang, Hao-Yan A1 Luo, Guang-Li A1 Chiu, Yu-Chuan A1 Kuan, Ting-Kai A1 Liu, Po-Tsun YR 2023 SN 2161-4644 K1 Performance evaluation K1 Fluids K1 Tensile strain K1 Conferences K1 Logic gates K1 Germanium K1 CMOS technology SP 25 OP 26 LK http://dx.doi.org/https://doi.org/10.23919/SNW57900.2023.10183954 DO https://doi.org/10.23919/SNW57900.2023.10183954 SF ELIB - SuUB Bremen
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