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1 Ergebnisse
1
Towards Epitaxial Ferroelectric HZO on n+-Si/Ge Substrates ..:
, In:
2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)
,
Zhao, Zefu
;
Chen, Yu-Rui
;
Chen, Yun-Wen
... - p. 1-2 , 2023
Link:
https://doi.org/10.23919/VLSITechnologyandCir57934.202..
RT T1 <cTitle>2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)</cTitle>: T1 <Title>Towards Epitaxial Ferroelectric HZO on n+-Si/Ge Substrates Achieving Record 2Pr = 84 μC/cm² and Endurance > 1E11</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10185233&Exemplar=1&LAN=DE A1 Zhao, Zefu A1 Chen, Yu-Rui A1 Chen, Yun-Wen A1 Hsieh, Wan-Hsuan A1 Wang, Jer-Fu A1 Lee, Jia-Yang A1 Xing, Yifan A1 Chen, Guan-Hua A1 Liu, C. W. YR 2023 SN 2158-9682 K1 Silicon compounds K1 Scanning electron microscopy K1 Transmission electron microscopy K1 Films K1 Superlattices K1 Very large scale integration K1 Tin SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.23919/VLSITechnologyandCir57934.2023.10185233 DO https://doi.org/10.23919/VLSITechnologyandCir57934.2023.10185233 SF ELIB - SuUB Bremen
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