I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
First Study of the Charge Trapping Aggravation Induced by A..:
, In:
2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)
,
Zhou, Zuopu
;
Jiao, Leming
;
Zheng, Zijie
... - p. 1-2 , 2023
Link:
https://doi.org/10.23919/VLSITechnologyandCir57934.202..
RT T1
2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)
: T1
First Study of the Charge Trapping Aggravation Induced by Anti-Ferroelectric Switching in the MFIS Stack
UL https://suche.suub.uni-bremen.de/peid=ieee-10185236&Exemplar=1&LAN=DE A1 Zhou, Zuopu A1 Jiao, Leming A1 Zheng, Zijie A1 Wang, Xiaolin A1 Zhang, Dong A1 Ni, Kai A1 Gong, Xiao YR 2023 SN 2158-9682 K1 Degradation K1 Systematics K1 Fluctuations K1 Switches K1 Very large scale integration K1 Predictive models K1 Iron SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.23919/VLSITechnologyandCir57934.2023.10185236 DO https://doi.org/10.23919/VLSITechnologyandCir57934.2023.10185236 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)