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14nm DRAM Development and Manufacturing:

, In: 2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits),

Kim, Kanguk ; Son, Youngwoo ; Ryu, Hoin... - p. 1-2 , 2023

Link: https://doi.org/10.23919/VLSITechnologyandCir57934.202..

RT 
T1 <cTitle>2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)</cTitle>: T1 <Title>14nm DRAM Development and Manufacturing</Title>

UL https://suche.suub.uni-bremen.de/peid=ieee-10185314&Exemplar=1&LAN=DE
				
A1 Kim, Kanguk
A1 Son, Youngwoo
A1 Ryu, Hoin
A1 Lee, Byunghyun
A1 Kim, Jooncheol
A1 Shin, Hyunsu
A1 Kang, Joonyoung
A1 Kim, Jihun
A1 Jeong, Shinwoo
A1 Chae, Kyosuk
A1 Lee, Dongkak
A1 Jung, Ilwoo
A1 Kim, Yongkwan
A1 Song, Boyoung
A1 Oh, Jeonghoon
A1 Song, Jungwoo
A1 Park, Seguen
A1 Lee, Keumjoo
A1 Ban, Hyodong
A1 Kim, Jiyoung
A1 Lee, Jooyoung
YR 2023
SN 2158-9682
K1 Performance evaluation
K1 MOSFET
K1 Random access memory
K1 Very large scale integration
K1 Market research
K1 Contact resistance
K1 Silicon
K1 DRAM
K1 Semiconductor
K1 Memory
K1 EUV
K1 DDR5
K1 Transistor and Scaling
SP 1
OP 2
LK http://dx.doi.org/https://doi.org/10.23919/VLSITechnologyandCir57934.2023.10185314
DO https://doi.org/10.23919/VLSITechnologyandCir57934.2023.10185314
SF ELIB - SuUB Bremen

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