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1 Ergebnisse
1
Precise VTH Control of MFSFET with 5 nm-thick FeND-HfO2 Rea..:
, In:
2023 Device Research Conference (DRC)
,
Ohmi, S.
;
Tanuma, M.
;
Shin, J.W.
- p. 1-2 , 2023
Link:
https://doi.org/10.1109/DRC58590.2023.10186916
RT T1
2023 Device Research Conference (DRC)
: T1
Precise VTH Control of MFSFET with 5 nm-thick FeND-HfO2 Realized by Kr-Plasma Sputtering for Pt Gate Electrode Deposition
UL https://suche.suub.uni-bremen.de/peid=ieee-10186916&Exemplar=1&LAN=DE A1 Ohmi, S. A1 Tanuma, M. A1 Shin, J.W. YR 2023 SN 2640-6853 K1 Electrodes K1 Zirconium K1 Logic gates K1 Threshold voltage K1 Plasmas K1 Hafnium compounds K1 Thermal analysis SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/DRC58590.2023.10186916 DO https://doi.org/10.1109/DRC58590.2023.10186916 SF ELIB - SuUB Bremen
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