I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
Enabling Plasma Etch Solution for GaN Technology:
, In:
2023 China Semiconductor Technology International Conference (CSTIC)
,
Wang, Zoe
;
Guo, Chunxiang
;
Liu, Jian
... - p. 1-3 , 2023
Link:
https://doi.org/10.1109/CSTIC58779.2023.10219159
RT T1 <cTitle>2023 China Semiconductor Technology International Conference (CSTIC)</cTitle>: T1 <Title>Enabling Plasma Etch Solution for GaN Technology</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10219159&Exemplar=1&LAN=DE A1 Wang, Zoe A1 Guo, Chunxiang A1 Liu, Jian A1 Feng, Yingxiong A1 Guan, Lulu A1 Xu, Kangning A1 Huang, Qiao A1 Chen, Lu A1 Xu, Kaidong YR 2023 K1 Technological innovation K1 Manufacturing processes K1 Instruments K1 Dry etching K1 High-voltage techniques K1 Robustness K1 Plasmas K1 Inductively Coupled Plasma (ICP) etching K1 GaN Technology K1 Atomic Layer Etch (ALE) K1 Low damage SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC58779.2023.10219159 DO https://doi.org/10.1109/CSTIC58779.2023.10219159 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)
