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1 Ergebnisse
1
Investigation of a New Disturb Effect in the Aggressively S..:
, In:
2023 China Semiconductor Technology International Conference (CSTIC)
,
Zhang, Yintong
;
Xu, Zhaozhao
;
Zhou, Dylan
... - p. 1-4 , 2023
Link:
https://doi.org/10.1109/CSTIC58779.2023.10219189
RT T1
2023 China Semiconductor Technology International Conference (CSTIC)
: T1
Investigation of a New Disturb Effect in the Aggressively Scaled Dual-Bit/Cell Split-Gate Floating-Gate Flash Cell
UL https://suche.suub.uni-bremen.de/peid=ieee-10219189&Exemplar=1&LAN=DE A1 Zhang, Yintong A1 Xu, Zhaozhao A1 Zhou, Dylan A1 Shen, Alan A1 Liu, Fredric A1 Fang, Ziquan A1 Liu, Donghua A1 Li, Gordon A1 Qian, Wensheng YR 2023 K1 Split gate flash memory cells K1 Etching K1 Current density K1 Substrates K1 NOR-type Dual-bit/cell (NORD) K1 Split-gate K1 Hot electron injection K1 Program disturb K1 Source-side injection SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC58779.2023.10219189 DO https://doi.org/10.1109/CSTIC58779.2023.10219189 SF ELIB - SuUB Bremen
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