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1 Ergebnisse
1
The Study of Silicon Nitride Films Deposited In Batch ALD S..:
, In:
2023 China Semiconductor Technology International Conference (CSTIC)
,
Cheng, Shiyao
;
Kuai, Wei
;
Duan, Wenxu
... - p. 1-4 , 2023
Link:
https://doi.org/10.1109/CSTIC58779.2023.10219244
RT T1 <cTitle>2023 China Semiconductor Technology International Conference (CSTIC)</cTitle>: T1 <Title>The Study of Silicon Nitride Films Deposited In Batch ALD System</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10219244&Exemplar=1&LAN=DE A1 Cheng, Shiyao A1 Kuai, Wei A1 Duan, Wenxu A1 Wang, Xinyang A1 Liu, Xiaomeng A1 Cheng, Shuo A1 Xie, Yuanxiang A1 Shi, Xiaoping YR 2023 K1 Fabrication K1 Wet etching K1 Temperature K1 Semiconductor devices K1 Silicon nitride K1 Pressure control K1 Throughput SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC58779.2023.10219244 DO https://doi.org/10.1109/CSTIC58779.2023.10219244 SF ELIB - SuUB Bremen
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