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1 Ergebnisse
1
Technical Difficulties and Optimization Methods of Nmos Sha..:
, In:
2023 China Semiconductor Technology International Conference (CSTIC)
,
Zhu, Peng
;
Xu, Renhui
;
Fu, Wentao
.. - p. 1-3 , 2023
Link:
https://doi.org/10.1109/CSTIC58779.2023.10219259
RT T1 <cTitle>2023 China Semiconductor Technology International Conference (CSTIC)</cTitle>: T1 <Title>Technical Difficulties and Optimization Methods of Nmos Share CT IN Contact Hole Etching</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10219259&Exemplar=1&LAN=DE A1 Zhu, Peng A1 Xu, Renhui A1 Fu, Wentao A1 Sun, Lei A1 Bao, Yu YR 2023 K1 Reflectivity K1 Graphics K1 Mass production K1 Costs K1 Loading K1 Optimization methods K1 Semiconductor device manufacture K1 Contact etch K1 Pattern loading K1 BVC K1 NMOS share CT K1 By product K1 CD uniformity SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC58779.2023.10219259 DO https://doi.org/10.1109/CSTIC58779.2023.10219259 SF ELIB - SuUB Bremen
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