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1 Ergebnisse
1
Pulsed DC Parameters (Reverse Voltage, Duty Cycle, Pulsed F..:
, In:
2023 China Semiconductor Technology International Conference (CSTIC)
,
Zhou, Wei-Yu
;
Tseng, Xue-Li
;
Yuan, Ning-Hsiu
... - p. 1-6 , 2023
Link:
https://doi.org/10.1109/CSTIC58779.2023.10219395
RT T1 <cTitle>2023 China Semiconductor Technology International Conference (CSTIC)</cTitle>: T1 <Title>Pulsed DC Parameters (Reverse Voltage, Duty Cycle, Pulsed Frequency) on Film Quality in Reactive Sputtered Aluminum Nitride Films</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10219395&Exemplar=1&LAN=DE A1 Zhou, Wei-Yu A1 Tseng, Xue-Li A1 Yuan, Ning-Hsiu A1 Lo, Hsiao-Han A1 Wang, Peter J. A1 Jiang, Ming-Yu A1 Fuh, Yiin-Kuen A1 Li, Tomi T. YR 2023 K1 Magnetic films K1 Voltage K1 Surface roughness K1 Silicon K1 Rough surfaces K1 Response surface methodology K1 Surface treatment K1 Reactive Pulsed DC magnetron sputtering K1 Aluminum nitride (AlN) K1 Design of experiment (DOE) K1 Pulse parameters SP 1 OP 6 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC58779.2023.10219395 DO https://doi.org/10.1109/CSTIC58779.2023.10219395 SF ELIB - SuUB Bremen
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