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In-situ measurements of etch rates in an electron-beam prod..:
, In:
IEEE Conference Record - Abstracts. 2002 IEEE International Conference on Plasma Science (Cat. No.02CH37340)
,
Balkey, M.M.
;
Leonhardt, D.
;
Walton, S.G.
... - p. 265 , 2002
Link:
https://doi.org/10.1109/PLASMA.2002.1030550
RT T1
IEEE Conference Record - Abstracts. 2002 IEEE International Conference on Plasma Science (Cat. No.02CH37340)
: T1
In-situ measurements of etch rates in an electron-beam produced plasma reactor
UL https://suche.suub.uni-bremen.de/peid=ieee-1030550&Exemplar=1&LAN=DE A1 Balkey, M.M. A1 Leonhardt, D. A1 Walton, S.G. A1 Blackwell, D.D. A1 Fernsler, R.F. A1 Murphy, D.P. A1 Meger, R.A. YR 2002 K1 Plasma measurements K1 Etching K1 Plasma applications K1 Inductors K1 Plasma properties K1 Plasma materials processing K1 Plasma temperature K1 Sheet materials K1 Magnetic field measurement K1 Gases SP 265 LK http://dx.doi.org/https://doi.org/10.1109/PLASMA.2002.1030550 DO https://doi.org/10.1109/PLASMA.2002.1030550 SF ELIB - SuUB Bremen
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