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1 Ergebnisse
1
Effect of thermal annealing in H2 atmosphere of SiCxOy film..:
, In:
2023 20th International Conference on Electrical Engineering, Computing Science and Automatic Control (CCE)
,
Trinidad, Juan Carlos Perez
;
Agustin, Marco Antonio Vasquez
;
Salgado, Godofredo Garcia
... - p. 1-7 , 2023
Link:
https://doi.org/10.1109/CCE60043.2023.10332817
RT T1 <cTitle>2023 20th International Conference on Electrical Engineering, Computing Science and Automatic Control (CCE)</cTitle>: T1 <Title>Effect of thermal annealing in H2 atmosphere of SiCxOy films obtained by HFCVD technique</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10332817&Exemplar=1&LAN=DE A1 Trinidad, Juan Carlos Perez A1 Agustin, Marco Antonio Vasquez A1 Salgado, Godofredo Garcia A1 Trujillo, Roman Romano A1 Marcos, Fernando Lopez A1 Vilchis, Heber A1 Andres, Enrique Rosendo A1 Arciniega, Jose Juan Gervacio A1 Martinez, Orlando Cortazar A1 Solis, Antonio Coyopol YR 2023 SN 2642-3766 K1 Atomic measurements K1 Silicon compounds K1 Annealing K1 Films K1 Photoelectron microscopy K1 Atmosphere K1 Lattices K1 SiCxOy HFCVD K1 PL K1 FTIR K1 XPS SP 1 OP 7 LK http://dx.doi.org/https://doi.org/10.1109/CCE60043.2023.10332817 DO https://doi.org/10.1109/CCE60043.2023.10332817 SF ELIB - SuUB Bremen
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