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1 Ergebnisse
1
Simulation study on the robustness of polar mark for incide..:
, In:
2023 International Workshop on Advanced Patterning Solutions (IWAPS)
,
Zhou, Guangying
;
Qi, Yuejing
;
Yao, Mingyi
... - p. 1-3 , 2023
Link:
https://doi.org/10.1109/IWAPS60466.2023.10366112
RT T1 <cTitle>2023 International Workshop on Advanced Patterning Solutions (IWAPS)</cTitle>: T1 <Title>Simulation study on the robustness of polar mark for incident light polarization states</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10366112&Exemplar=1&LAN=DE A1 Zhou, Guangying A1 Qi, Yuejing A1 Yao, Mingyi A1 Li, Liang A1 Jiang, Miao A1 Shi, Jiangliu YR 2023 K1 Optical polarization K1 Simulation K1 Conferences K1 Lithography K1 Robustness K1 polar mark K1 polarization K1 segmented alignment mark K1 rigorous coupled wave analysis K1 wet recess process SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/IWAPS60466.2023.10366112 DO https://doi.org/10.1109/IWAPS60466.2023.10366112 SF ELIB - SuUB Bremen
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