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1 Ergebnisse
1
A Masked Autoencoder -Based Approach for Defect Classificat..:
, In:
2023 International Workshop on Advanced Patterning Solutions (IWAPS)
,
Lu, Hu
;
Shen, Jiwei
;
Zhao, Botong
... - p. 1-4 , 2023
Link:
https://doi.org/10.1109/IWAPS60466.2023.10366134
RT T1 <cTitle>2023 International Workshop on Advanced Patterning Solutions (IWAPS)</cTitle>: T1 <Title>A Masked Autoencoder -Based Approach for Defect Classification in Semiconductor Manufacturing</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10366134&Exemplar=1&LAN=DE A1 Lu, Hu A1 Shen, Jiwei A1 Zhao, Botong A1 Lou, Pengjie A1 Zhou, Wenzhan A1 Zhou, Kan A1 Zhao, Xintong A1 Lyu, Shujing A1 Lu, Yue YR 2023 K1 Semiconductor device modeling K1 Scanning electron microscopy K1 Costs K1 Manuals K1 Semiconductor device manufacture K1 Predictive models K1 Manufacturing K1 Masked Autoencoder K1 Defect Classification K1 Semiconductor Manufacturing K1 Self-supervised Pretraining SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/IWAPS60466.2023.10366134 DO https://doi.org/10.1109/IWAPS60466.2023.10366134 SF ELIB - SuUB Bremen
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