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1 Ergebnisse
1
Impact of n+/p+-doped Polysilicon Gate in Lateral Overflow ..:
, In:
2023 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK)
,
Sato, Yoshihiro
;
Kobayashi, Tsutomu
;
Yamada, Takayoshi
.. - p. 1-2 , 2023
Link:
https://doi.org/10.1109/IMFEDK60983.2023.10366332
RT T1
2023 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK)
: T1
Impact of n+/p+-doped Polysilicon Gate in Lateral Overflow Transistor on Organic Photoconductive Film CMOS Image Sensor Dark Currents
UL https://suche.suub.uni-bremen.de/peid=ieee-10366332&Exemplar=1&LAN=DE A1 Sato, Yoshihiro A1 Kobayashi, Tsutomu A1 Yamada, Takayoshi A1 Nishimura, Kazuko A1 Murakami, Masashi YR 2023 SN 2836-9947 K1 Electrodes K1 Simulation K1 Dark current K1 Logic gates K1 CMOS image sensors K1 Threshold voltage K1 Transistors K1 CMOS image sensor K1 Leakage current K1 Lateral overflow transistor SP 1 OP 2 LK http://dx.doi.org/https://doi.org/10.1109/IMFEDK60983.2023.10366332 DO https://doi.org/10.1109/IMFEDK60983.2023.10366332 SF ELIB - SuUB Bremen
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