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1 Ergebnisse
1
Application of Methyl Trichlorosilane in SiC Growth:
, In:
2023 20th China International Forum on Solid State Lighting & 2023 9th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS)
,
Guo, Ning
;
Pei, Yicheng
;
Yuan, Weilong
... - p. 6-9 , 2023
Link:
https://doi.org/10.1109/SSLChinaIFWS60785.2023.1039973
RT T1 <cTitle>2023 20th China International Forum on Solid State Lighting & 2023 9th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS)</cTitle>: T1 <Title>Application of Methyl Trichlorosilane in SiC Growth</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10399738&Exemplar=1&LAN=DE A1 Guo, Ning A1 Pei, Yicheng A1 Yuan, Weilong A1 Li, Yunkai A1 Zhao, Siqi A1 Yang, Shangyu A1 Zhang, Yang A1 Liu, Xingfang YR 2023 K1 Gases K1 Silicon carbide K1 Photonic band gap K1 Epitaxial layers K1 Adhesives K1 Semiconductor device reliability K1 Fluid flow SP 6 OP 9 LK http://dx.doi.org/https://doi.org/10.1109/SSLChinaIFWS60785.2023.10399738 DO https://doi.org/10.1109/SSLChinaIFWS60785.2023.10399738 SF ELIB - SuUB Bremen
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