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1 Ergebnisse
1
First Demonstration of Annealing-Free Top Gate La:HZO-IGZO ..:
, In:
2023 International Electron Devices Meeting (IEDM)
,
Zeng, Min
;
Hu, Qianlan
;
Li, Qijun
... - p. 1-4 , 2023
Link:
https://doi.org/10.1109/IEDM45741.2023.10413682
RT T1 <cTitle>2023 International Electron Devices Meeting (IEDM)</cTitle>: T1 <Title>First Demonstration of Annealing-Free Top Gate La:HZO-IGZO FeFET with Record Memory Window and Endurance</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10413682&Exemplar=1&LAN=DE A1 Zeng, Min A1 Hu, Qianlan A1 Li, Qijun A1 Liu, Honggang A1 Yan, Shiwei A1 Gu, Chengru A1 Zhao, Wenjie A1 Huang, Ru A1 Wu, Yanqing YR 2023 SN 2156-017X K1 Temperature measurement K1 Annealing K1 Voltage measurement K1 Films K1 Capacitors K1 Logic gates K1 FeFETs SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/IEDM45741.2023.10413682 DO https://doi.org/10.1109/IEDM45741.2023.10413682 SF ELIB - SuUB Bremen
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