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1 Ergebnisse
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A Logic-Process Compatible RRAM with 15.43 Mb/mm2 Density a..:
, In:
2023 International Electron Devices Meeting (IEDM)
,
Wang, Qishen
;
Yang, Yuhang
;
Wang, Zongwei
... - p. 1-4 , 2023
Link:
https://doi.org/10.1109/IEDM45741.2023.10413885
RT T1
2023 International Electron Devices Meeting (IEDM)
: T1
A Logic-Process Compatible RRAM with 15.43 Mb/mm2 Density and 10years@150°C retention using STI-less Dynamic-Gate and Self-Passivation Sidewall
UL https://suche.suub.uni-bremen.de/peid=ieee-10413885&Exemplar=1&LAN=DE A1 Wang, Qishen A1 Yang, Yuhang A1 Wang, Zongwei A1 Bao, Shengyu A1 Sun, Jingwei A1 Shan, Linbo A1 Bao, Lin A1 Gao, Yi A1 Zhang, Haisu A1 Ling, Yaotian A1 Zhang, Wuzhi A1 Wang, Yansheng A1 Cai, Yimao A1 Huang, Ru YR 2023 SN 2156-017X K1 Semiconductor device measurement K1 Current measurement K1 Scalability K1 Production K1 Logic gates K1 CMOS technology K1 Transistors SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/IEDM45741.2023.10413885 DO https://doi.org/10.1109/IEDM45741.2023.10413885 SF ELIB - SuUB Bremen
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