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1 Ergebnisse
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Process Development and Integration on Si Substrate for Ion..:
, In:
2023 IEEE 25th Electronics Packaging Technology Conference (EPTC)
,
Li, H. Y.
;
Liu Huihong, Clarence
;
Jaafar, Norhanani
... - p. 253-256 , 2023
Link:
https://doi.org/10.1109/EPTC59621.2023.10457687
RT T1
2023 IEEE 25th Electronics Packaging Technology Conference (EPTC)
: T1
Process Development and Integration on Si Substrate for Ion trap-based Quantum Processors
UL https://suche.suub.uni-bremen.de/peid=ieee-10457687&Exemplar=1&LAN=DE A1 Li, H. Y. A1 Liu Huihong, Clarence A1 Jaafar, Norhanani A1 Ahmadi, Morteza A1 Kumar, Mishra Dileep A1 Simonl, Goh Chun Kiat A1 YanYan, Zhou A1 Mukherjee, Manas A1 Jien, Chui King YR 2023 K1 Electrodes K1 Radio frequency K1 Electron traps K1 Surface waves K1 Conductivity K1 Ions K1 Silicon SP 253 OP 256 LK http://dx.doi.org/https://doi.org/10.1109/EPTC59621.2023.10457687 DO https://doi.org/10.1109/EPTC59621.2023.10457687 SF ELIB - SuUB Bremen
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