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1 Ergebnisse
1
Impact of High-K Deposition Process on the Noise Immunity o..:
, In:
2023 IEEE International Integrated Reliability Workshop (IIRW)
,
Raffel, Yannick
;
Olivo, Ricardo
;
Lederer, Maximilian
... - p. 1-4 , 2023
Link:
https://doi.org/10.1109/IIRW59383.2023.10477638
RT T1 <cTitle>2023 IEEE International Integrated Reliability Workshop (IIRW)</cTitle>: T1 <Title>Impact of High-K Deposition Process on the Noise Immunity of FeFETs and their Applicability Towards In-Memory-Computing</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10477638&Exemplar=1&LAN=DE A1 Raffel, Yannick A1 Olivo, Ricardo A1 Lederer, Maximilian A1 Pirro, Luca A1 Parmar, Vivek A1 Chohan, Talha A1 Lehninger, David A1 De, Sourav A1 Kampfe, Thomas A1 Seidel, Konrad A1 Suri, Manan A1 Heitmann, Johannes YR 2023 SN 2374-8036 K1 Performance evaluation K1 Neural networks K1 Materials reliability K1 Low-frequency noise K1 Hafnium compounds K1 High-k dielectric materials K1 Transistors K1 In-memory computing K1 Flicker noise K1 interface traps K1 FeFET K1 hafnium oxide K1 and interface treatments SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/IIRW59383.2023.10477638 DO https://doi.org/10.1109/IIRW59383.2023.10477638 SF ELIB - SuUB Bremen
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