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1 Ergebnisse
1
Process Variation Impact on Dual Dielectric Gate-All-Around..:
, In:
2024 International Conference on Computer, Electrical & Communication Engineering (ICCECE)
,
Kumar, Pankaj
;
Chauhan, Ajay
;
Raj, Samant
.. - p. 1-4 , 2024
Link:
https://doi.org/10.1109/ICCECE58645.2024.10497410
RT T1
2024 International Conference on Computer, Electrical & Communication Engineering (ICCECE)
: T1
Process Variation Impact on Dual Dielectric Gate-All-Around Tunnel FETs
UL https://suche.suub.uni-bremen.de/peid=ieee-10497410&Exemplar=1&LAN=DE A1 Kumar, Pankaj A1 Chauhan, Ajay A1 Raj, Samant A1 Koley, Kalyan A1 Raturi, Poonam YR 2024 SN 2768-0576 K1 Geometry K1 Fabrication K1 Radio frequency K1 Gallium arsenide K1 Logic gates K1 Tunneling K1 Ions K1 TFET K1 Gate-all-around TFET K1 dual-dielectric K1 Analog K1 RF SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/ICCECE58645.2024.10497410 DO https://doi.org/10.1109/ICCECE58645.2024.10497410 SF ELIB - SuUB Bremen
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