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1 Ergebnisse
1
A Novel Hafnia-based Ferroelectric Capacitor with Antiferro..:
, In:
2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
,
Yang, Mengxuan
;
Wang, Kaifeng
;
Yu, Bocheng
... - p. 1-3 , 2024
Link:
https://doi.org/10.1109/EDTM58488.2024.10511327
RT T1 <cTitle>2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)</cTitle>: T1 <Title>A Novel Hafnia-based Ferroelectric Capacitor with Antiferroelectric Zirconia Seed Layer for High Ferroelectricity and Endurance</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10511327&Exemplar=1&LAN=DE A1 Yang, Mengxuan A1 Wang, Kaifeng A1 Yu, Bocheng A1 Fu, Zhiyuan A1 Su, Chang A1 Huang, Ru A1 Huang, Qianqian YR 2024 K1 Nonvolatile memory K1 Ferroelectric films K1 Capacitors K1 Random access memory K1 Iron K1 Manufacturing K1 Leakage currents K1 FeRAM K1 HZO and ZrO2 SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/EDTM58488.2024.10511327 DO https://doi.org/10.1109/EDTM58488.2024.10511327 SF ELIB - SuUB Bremen
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