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1 Ergebnisse
1
Ultra-Fast Oxide Traps in Sub-20-nm DRAM Technology: from C..:
, In:
2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
,
Wang, Da
;
Liu, Yong
;
Xue, Yongkang
... - p. 1-3 , 2024
Link:
https://doi.org/10.1109/EDTM58488.2024.10511687
RT T1 <cTitle>2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)</cTitle>: T1 <Title>Ultra-Fast Oxide Traps in Sub-20-nm DRAM Technology: from Characterization to Physical origin identification</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10511687&Exemplar=1&LAN=DE A1 Wang, Da A1 Liu, Yong A1 Xue, Yongkang A1 Ren, Pengpeng A1 Sun, Zixuan A1 Wang, Zirui A1 Liu, Yueyang A1 Cheng, Zhijun A1 Yang, Haiyang A1 Liu, Xiangli A1 Wu, Blacksmith A1 Cao, Kanyu A1 Wang, Runsheng A1 Ji, Zhigang A1 Huang, Ru YR 2024 K1 Charge pumps K1 Correlation K1 Random access memory K1 Plasmas K1 Manufacturing K1 Nitrogen K1 Time factors K1 Charge pumping K1 DRAM K1 ultra-fast traps K1 nitrogen substitution defects SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/EDTM58488.2024.10511687 DO https://doi.org/10.1109/EDTM58488.2024.10511687 SF ELIB - SuUB Bremen
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