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1 Ergebnisse
1
High quality PVD-MoS2 film on plasma-ALD-SiO2 underlaying m..:
, In:
2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
,
Matsunaga, Naoki
;
Imai, Shinya
;
Shirokura, Takanori
... - p. 1-3 , 2024
Link:
https://doi.org/10.1109/EDTM58488.2024.10511906
RT T1 <cTitle>2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)</cTitle>: T1 <Title>High quality PVD-MoS2 film on plasma-ALD-SiO2 underlaying material for CFET integration</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10511906&Exemplar=1&LAN=DE A1 Matsunaga, Naoki A1 Imai, Shinya A1 Shirokura, Takanori A1 Tsutsui, Kazuo A1 Kakushima, Kuniyuki A1 Wakabayashi, Hitoshi YR 2024 K1 Silicon compounds K1 Three-dimensional displays K1 Fast Fourier transforms K1 Surface roughness K1 Rough surfaces K1 Sulfur K1 Velocity measurement K1 CFET K1 molybdenum disulfide (MoS2) K1 transition metal dichalcogenide K1 plasma-ALD SiO2 K1 Raman spectroscopy and RF magnetron sputtering SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/EDTM58488.2024.10511906 DO https://doi.org/10.1109/EDTM58488.2024.10511906 SF ELIB - SuUB Bremen
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