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1 Ergebnisse
1
Enhanced Polarization, Endurance, and Long Retention in Low..:
, In:
2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
,
Ali, Md Hanif
;
Pandey, Adityanarayan
;
Shirodkar, Soham
... - p. 1-3 , 2024
Link:
https://doi.org/10.1109/EDTM58488.2024.10511921
RT T1 <cTitle>2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)</cTitle>: T1 <Title>Enhanced Polarization, Endurance, and Long Retention in Low Temperature Processed W/Hf0.5Zr0.5O2/W Ferroelectric Capacitor for Back-End-of-Line Integration</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10511921&Exemplar=1&LAN=DE A1 Ali, Md Hanif A1 Pandey, Adityanarayan A1 Shirodkar, Soham A1 Srinu, Rowtu A1 Meihar, Paritosh A1 Ganguly, Udayan A1 Deshpande, Veeresh YR 2024 K1 Temperature measurement K1 Rapid thermal annealing K1 Temperature K1 Rapid thermal processing K1 Nonvolatile memory K1 Capacitors K1 Random access memory K1 Low thermal budget K1 Annealing time K1 Remnant polarization K1 Endurance K1 Retention SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/EDTM58488.2024.10511921 DO https://doi.org/10.1109/EDTM58488.2024.10511921 SF ELIB - SuUB Bremen
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