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1 Ergebnisse
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Investigation of Amorphous Silicon as Dry Etch Hard Mask in..:
, In:
2024 Conference of Science and Technology for Integrated Circuits (CSTIC)
,
Yin, Juxin
;
Zheng, Fuqiang
;
Shu, Liufei
... - p. 1-3 , 2024
Link:
https://doi.org/10.1109/CSTIC61820.2024.10531875
RT T1 <cTitle>2024 Conference of Science and Technology for Integrated Circuits (CSTIC)</cTitle>: T1 <Title>Investigation of Amorphous Silicon as Dry Etch Hard Mask in BEOL Low-k Dielectric Patterning</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10531875&Exemplar=1&LAN=DE A1 Yin, Juxin A1 Zheng, Fuqiang A1 Shu, Liufei A1 Zhang, Yan A1 Shen, Jingru A1 Yang, Wanli A1 Li, Yunlong A1 Zhang, Xuqing A1 Gao, Dawei YR 2024 K1 Integrated circuits K1 Manufacturing processes K1 Chemistry K1 Metals K1 Amorphous silicon K1 Etching K1 Dielectrics SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC61820.2024.10531875 DO https://doi.org/10.1109/CSTIC61820.2024.10531875 SF ELIB - SuUB Bremen
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