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1 Ergebnisse
1
Line Edge Roughness Reduction in High Aspect Ratio Carbon H..:
, In:
2024 Conference of Science and Technology for Integrated Circuits (CSTIC)
,
Zeng, Li
;
Xu, Li-Tian
;
Zhu, Mengjiao
- p. 1-3 , 2024
Link:
https://doi.org/10.1109/CSTIC61820.2024.10531928
RT T1 <cTitle>2024 Conference of Science and Technology for Integrated Circuits (CSTIC)</cTitle>: T1 <Title>Line Edge Roughness Reduction in High Aspect Ratio Carbon Hardmask Patterning for Slit Trench</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10531928&Exemplar=1&LAN=DE A1 Zeng, Li A1 Xu, Li-Tian A1 Zhu, Mengjiao YR 2024 K1 Integrated circuits K1 Memory management K1 Ions K1 Etching K1 Plasmas K1 Polymers K1 Carbon K1 LER reduction K1 High aspect ratio K1 carbon hardmask etching K1 flash memory SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC61820.2024.10531928 DO https://doi.org/10.1109/CSTIC61820.2024.10531928 SF ELIB - SuUB Bremen
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