I agree that this site is using cookies. You can find further informations
here
.
X
Login
Merkliste (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
zur Desktop-Version
Toggle navigation
Merkliste
1 Ergebnisse
1
A Fully Automated VPD System for Noble Metal Control During..:
, In:
2024 Conference of Science and Technology for Integrated Circuits (CSTIC)
,
Huang, Qiao
;
Cui, Hushan
;
Zou, Zhiwen
... - p. 1-04 , 2024
Link:
https://doi.org/10.1109/CSTIC61820.2024.10531961
RT T1 <cTitle>2024 Conference of Science and Technology for Integrated Circuits (CSTIC)</cTitle>: T1 <Title>A Fully Automated VPD System for Noble Metal Control During CIS Manufacturing</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10531961&Exemplar=1&LAN=DE A1 Huang, Qiao A1 Cui, Hushan A1 Zou, Zhiwen A1 Cheng, Shiran A1 Zhu, Lei A1 Zhang, Hao A1 Xue, Chaobo A1 Feng, Jiali A1 Hua, Qiang A1 Zhu, Xiaoqing A1 Liu, Wuping A1 Xu, Kaidong YR 2024 K1 Gold K1 Silver K1 Surface contamination K1 Semiconductor devices K1 Metals K1 Mass spectroscopy K1 Plasmas K1 Vapor Phase Decomposition (VPD) K1 Noble metal contamination K1 Aqua Regia K1 Inductively Coupled Plasma Mass Spectroscopy (ICP-MS) K1 CMOS image sensor (CIS) SP 1 OP 04 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC61820.2024.10531961 DO https://doi.org/10.1109/CSTIC61820.2024.10531961 SF ELIB - SuUB Bremen
Export
RefWorks (nur Desktop-Version!)
Flow
(Zuerst in
Flow
einloggen, dann importieren)
