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1 Ergebnisse
1
Improving Gate Oxide Uniformity Using Wet-Dry Oxidation for..:
, In:
2024 Conference of Science and Technology for Integrated Circuits (CSTIC)
,
Tang, Lin
;
Xie, Weisi
;
Jia, Zeqi
... - p. 1-3 , 2024
Link:
https://doi.org/10.1109/CSTIC61820.2024.10532044
RT T1 <cTitle>2024 Conference of Science and Technology for Integrated Circuits (CSTIC)</cTitle>: T1 <Title>Improving Gate Oxide Uniformity Using Wet-Dry Oxidation for Semiconductor Manufacturing</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10532044&Exemplar=1&LAN=DE A1 Tang, Lin A1 Xie, Weisi A1 Jia, Zeqi A1 Chen, Xiwei A1 Zhang, Yunyan A1 Luo, Jinjiang A1 Gao, Dawei A1 Fang, Wenzhang YR 2024 K1 Performance evaluation K1 Integrated circuits K1 Fluid flow K1 Logic gates K1 Semiconductor device manufacture K1 Oxidation SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC61820.2024.10532044 DO https://doi.org/10.1109/CSTIC61820.2024.10532044 SF ELIB - SuUB Bremen
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