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1 Ergebnisse
1
CEO2 Slurry Post Rinse Condition Research in STI CMP Techno..:
, In:
2024 Conference of Science and Technology for Integrated Circuits (CSTIC)
,
Zhang, ZhiJie
;
Li, ZhengYi
;
Wang, HongDi
. - p. 1-4 , 2024
Link:
https://doi.org/10.1109/CSTIC61820.2024.10532081
RT T1 <cTitle>2024 Conference of Science and Technology for Integrated Circuits (CSTIC)</cTitle>: T1 <Title>CEO2 Slurry Post Rinse Condition Research in STI CMP Technology</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10532081&Exemplar=1&LAN=DE A1 Zhang, ZhiJie A1 Li, ZhengYi A1 Wang, HongDi A1 Li, Jian YR 2024 K1 Integrated circuits K1 Cerium K1 Market research K1 Chemical reactions K1 Slurries K1 Surface treatment K1 Chemicals K1 STI-CMP K1 CE02 slurry K1 post-rinse K1 thickness SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/CSTIC61820.2024.10532081 DO https://doi.org/10.1109/CSTIC61820.2024.10532081 SF ELIB - SuUB Bremen
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