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1 Ergebnisse
1
TEOS Integrated High-Low Pressure RPS Clean: APC: Advanced ..:
, In:
2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Kai, Tan Hong
;
Yuang, Kenneth Mah Chih
;
Chou, Chiam Chek
... - p. 1-3 , 2024
Link:
https://doi.org/10.1109/ASMC61125.2024.10545361
RT T1 <cTitle>2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>TEOS Integrated High-Low Pressure RPS Clean: APC: Advanced Process Control</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10545361&Exemplar=1&LAN=DE A1 Kai, Tan Hong A1 Yuang, Kenneth Mah Chih A1 Chou, Chiam Chek A1 Chuah, Koh A1 Peng, Lau Ker A1 Jun, Xie YR 2024 SN 2376-6697 K1 Costs K1 Fluorine K1 Production K1 Semiconductor device manufacture K1 Throughput K1 Cleaning K1 Plasmas K1 PECVD K1 mean free path K1 remote plasma cleaning K1 gas usage K1 NF3 SP 1 OP 3 LK http://dx.doi.org/https://doi.org/10.1109/ASMC61125.2024.10545361 DO https://doi.org/10.1109/ASMC61125.2024.10545361 SF ELIB - SuUB Bremen
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