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1 Ergebnisse
1
Real-time etching process monitoring and end-point detectio..:
, In:
2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Gasc, Sebastien
;
Binda, Federico
;
Kanungo, Pratyush Das
.. - p. 01-04 , 2024
Link:
https://doi.org/10.1109/ASMC61125.2024.10545445
RT T1 <cTitle>2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>Real-time etching process monitoring and end-point detection with a time-of-flight mass spectrometer</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10545445&Exemplar=1&LAN=DE A1 Gasc, Sebastien A1 Binda, Federico A1 Kanungo, Pratyush Das A1 Hofer, Lukas A1 Rothenberger, Maximilian YR 2024 SN 2376-6697 K1 Silicon compounds K1 Optical interferometry K1 Spectroscopy K1 Stimulated emission K1 Semiconductor lasers K1 Sulfur hexafluoride K1 Semiconductor device manufacture K1 real-time process monitoring K1 time-of-flight mass spectrometry K1 dry etching K1 endpoint detection SP 01 OP 04 LK http://dx.doi.org/https://doi.org/10.1109/ASMC61125.2024.10545445 DO https://doi.org/10.1109/ASMC61125.2024.10545445 SF ELIB - SuUB Bremen
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