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1 Ergebnisse
1
Lithography WEE, EBR and Pre-SiGe HF Clean Flow Rate Optimi..:
, In:
2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Chow, Jane
;
Adukkadukkam, Dineshan
;
Siong, Eng Choon
.. - p. 1-4 , 2024
Link:
https://doi.org/10.1109/ASMC61125.2024.10545461
RT T1 <cTitle>2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>Lithography WEE, EBR and Pre-SiGe HF Clean Flow Rate Optimization for Wafer Edge Defectivity Improvement</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10545461&Exemplar=1&LAN=DE A1 Chow, Jane A1 Adukkadukkam, Dineshan A1 Siong, Eng Choon A1 Ong, Derrick A1 Sean, Tan Kiat YR 2024 SN 2376-6697 K1 Fabrication K1 Costs K1 Image edge detection K1 Lithography K1 Process control K1 Focusing K1 Hafnium SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/ASMC61125.2024.10545461 DO https://doi.org/10.1109/ASMC61125.2024.10545461 SF ELIB - SuUB Bremen
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