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1 Ergebnisse
1
Optimization of Area Selective Barrier on Different Metal I..:
, In:
2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Wangoh, Linda
;
Simon, Andrew
;
Shoudy, Matthew
- p. 1-4 , 2024
Link:
https://doi.org/10.1109/ASMC61125.2024.10545462
RT T1 <cTitle>2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>Optimization of Area Selective Barrier on Different Metal Interconnects</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10545462&Exemplar=1&LAN=DE A1 Wangoh, Linda A1 Simon, Andrew A1 Shoudy, Matthew YR 2024 SN 2376-6697 K1 Fabrication K1 Atomic layer deposition K1 Metals K1 Semiconductor device manufacture K1 Conductivity K1 Surface treatment K1 Tuning K1 Self-Assembled Monolayer K1 selective deposition K1 metal interconnects SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/ASMC61125.2024.10545462 DO https://doi.org/10.1109/ASMC61125.2024.10545462 SF ELIB - SuUB Bremen
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