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1 Ergebnisse
1
Hafnium Chloride Pulse Time Reduction on Atomic Layer Depos..:
, In:
2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Rajachidambaram, Meena
;
Rodman, Bridgette
;
Bennett, Alyssa
.. - p. 1-5 , 2024
Link:
https://doi.org/10.1109/ASMC61125.2024.10545469
RT T1 <cTitle>2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>Hafnium Chloride Pulse Time Reduction on Atomic Layer Deposited High-K HfO2 Dielectric Films</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10545469&Exemplar=1&LAN=DE A1 Rajachidambaram, Meena A1 Rodman, Bridgette A1 Bennett, Alyssa A1 Clements, Justin A1 Korevaar, Bas YR 2024 SN 2376-6697 K1 Water K1 Performance evaluation K1 Atomic layer deposition K1 Modulation K1 Semiconductor device manufacture K1 Throughput K1 Manufacturing SP 1 OP 5 LK http://dx.doi.org/https://doi.org/10.1109/ASMC61125.2024.10545469 DO https://doi.org/10.1109/ASMC61125.2024.10545469 SF ELIB - SuUB Bremen
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