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1 Ergebnisse
1
ScCO2 Drying for Preventing Pattern Collapse in Advanced Lo..:
, In:
2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Sankarapandian, M.
;
Lo, Wei-Shang
;
Ramirez, Alma Vela
... - p. 1-4 , 2024
Link:
https://doi.org/10.1109/ASMC61125.2024.10545479
RT T1 <cTitle>2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>ScCO2 Drying for Preventing Pattern Collapse in Advanced Logic Device Structures</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10545479&Exemplar=1&LAN=DE A1 Sankarapandian, M. A1 Lo, Wei-Shang A1 Ramirez, Alma Vela A1 Flores, Nash A1 Liu, Xuan A1 Yamanaka, Reijiro A1 Inoue, Saya A1 Shimomura, Shinichiro A1 Iwanaga, Koji YR 2024 SN 2376-6697 K1 Liquids K1 Logic gates K1 Semiconductor device manufacture K1 Ions K1 Nanoscale devices K1 Cleaning K1 Surface tension K1 Nanosheet K1 pattern collapse K1 drying K1 RIE cleaning K1 ScCO2 SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/ASMC61125.2024.10545479 DO https://doi.org/10.1109/ASMC61125.2024.10545479 SF ELIB - SuUB Bremen
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