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NVM Tunnel Oxide Integration in an Advanced BCD Node and it..:
, In:
2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
,
Liu, Gang
;
Lipinski, Matthias
;
Hose, Sallie
. - p. 1-4 , 2024
Link:
https://doi.org/10.1109/ASMC61125.2024.10545482
RT T1 <cTitle>2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)</cTitle>: T1 <Title>NVM Tunnel Oxide Integration in an Advanced BCD Node and its Impact on GOI</Title> UL https://suche.suub.uni-bremen.de/peid=ieee-10545482&Exemplar=1&LAN=DE A1 Liu, Gang A1 Lipinski, Matthias A1 Hose, Sallie A1 Menon, Santosh YR 2024 SN 2376-6697 K1 Semiconductor device measurement K1 Silicon nitride K1 Logic gates K1 Semiconductor device manufacture K1 Phosphorus K1 Oxidation K1 Dielectric measurement K1 BCD K1 Tunnel Oxide K1 GOI K1 TDDB SP 1 OP 4 LK http://dx.doi.org/https://doi.org/10.1109/ASMC61125.2024.10545482 DO https://doi.org/10.1109/ASMC61125.2024.10545482 SF ELIB - SuUB Bremen
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